Dr. Seongtae Jeong
Intel Fellow at Intel Corporation
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Logic, Optical lithography, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data, Model-based design, Phase shifts

Proceedings Article | 21 July 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Mirrors, Scattering, Particles, Photons, Inspection, Interference (communication), Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 30 December 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Multilayers, Scattering, Sensors, Scanners, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection, Defect inspection

Proceedings Article | 30 December 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Multilayers, Reticles, Inspection, Chromium, Scanning electron microscopy, Printing, Silicon films, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 19 July 1999
Proc. SPIE. 3749, 18th Congress of the International Commission for Optics
KEYWORDS: Signal to noise ratio, Multilayers, X-ray optics, Reflectivity, Nondestructive evaluation, Ultrasonics, Picosecond phenomena, Molybdenum, Acoustics, Absorption

Proceedings Article | 25 June 1999
Proc. SPIE. 3676, Emerging Lithographic Technologies III
KEYWORDS: Multilayers, Defect detection, Opacity, Sensors, Particles, Inspection, Photomasks, Extreme ultraviolet lithography, Signal detection, Defect inspection

Showing 5 of 8 publications
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