Dr. Serdar Manakli
CEO at Aselta Nanographics
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Logic, Optical lithography, Data modeling, Modulation, Metals, Electroluminescence, Maskless lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Electron beam lithography, Point spread functions, Modulation, Metals, Photomasks, Cadmium sulfide, Critical dimension metrology, Algorithm development, Optics manufacturing, Data corrections

PROCEEDINGS ARTICLE | April 4, 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Lithography, Electron beam lithography, Logic, Optical lithography, Modulation, Electroluminescence, Line edge roughness, Electron beam direct write lithography, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | April 1, 2010
Proc. SPIE. 7637, Alternative Lithographic Technologies II
KEYWORDS: Electron beam lithography, Electron beams, Logic, Modulation, Etching, Metals, Electroluminescence, Line edge roughness, Electron beam direct write lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Point spread functions, Cadmium, Data modeling, Error analysis, 3D modeling, Critical dimension metrology, Geometrical optics, Virtual reality, Electron beam direct write lithography, Model-based design

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Optical lithography, Electroluminescence, Line edge roughness, Electron beam direct write lithography, Semiconducting wafers, Optics manufacturing, Standards development

Showing 5 of 24 publications
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