Dr. Serge Biesemans
VP at Tokyo Electron Europe Ltd
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 8 April 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Switching, Calibration, 3D modeling, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Data modeling, Calibration, Ultraviolet radiation, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Modeling and simulation, Stochastic processes

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Reticles, Logic, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Semiconducting wafers

Proceedings Article | 27 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Image processing, Ultraviolet radiation, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Absorption, Chemically amplified resists

Proceedings Article | 27 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Calibration, Polymers, Ultraviolet radiation, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Absorption, Chemically amplified resists

Showing 5 of 15 publications
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