Serge Tedesco
Program Manager at Commissariat a l'Energie Atomique
SPIE Involvement:
Publications (11)

Proceedings Article | 4 April 2011 Paper
L. Pain, B. Icard, M. Martin, C. Constancias, S. Tedesco, P. Wiedeman, A. Farah, B. Kampherbeek, C. Pieczulewski, H. Kandrashov
Proceedings Volume 7970, 79700Y (2011)
KEYWORDS: Lithography, Photoresist processing, Semiconducting wafers, Maskless lithography, Manufacturing, Reliability, Silicon, Electrons, Projection systems, High volume manufacturing

Proceedings Article | 28 March 2008 Paper
L. Pain, B. Icard, S. Tedesco, B. Kampherbeek, G. Gross, C. Klein, H. Loeschner, E. Platzgummer, R. Morgan, S. Manakli, J. Kretz, C. Holhe, K.-H. Choi, F. Thrum, E. Kassel, W. Pilz, K. Keil, J. Butschke, M. Irmscher, F. Letzkus, P. Hudek, A. Paraskevopoulos, P. Ramm, J. Weber
Proceedings Volume 6921, 69211S (2008)
KEYWORDS: Semiconducting wafers, Lithography, Photomasks, Manufacturing, Electron beams, Electron beam lithography, Nanofabrication, Computed tomography, Prototyping, Maskless lithography

Proceedings Article | 26 March 2007 Paper
Cyril Vannuffel, Damien Djian, Serge Tedesco, Dimitra Niakoula, Panagiotis Argitis, Veroniki Vidali, Elias Couladouros, Harun Solak
Proceedings Volume 6519, 651949 (2007)
KEYWORDS: Head-mounted displays, Line edge roughness, Cadmium sulfide, Glasses, Molecules, Lithography, Extreme ultraviolet lithography, Photoresist processing, Electron beam lithography, Diffusion

Proceedings Article | 24 July 2002 Paper
Murielle Charpin, Laurent Pain, Serge Tedesco, C. Gourgon, A. Andrei, Daniel Henry, Yves LaPlanche, Ryotaro Hanawa, Tadashi Kusumoto, Masumi Suetsugu, H. Yokoyama
Proceedings Volume 4690, (2002)
KEYWORDS: Polymers, Electron beam lithography, Etching, Lithography, Palladium, Industrial chemicals, Semiconducting wafers, Diffusion, Prototyping, Critical dimension metrology

Proceedings Article | 24 August 2001 Paper
Laurent Pain, C. Gourgon, K. Patterson, B. Scarfogliere, Serge Tedesco, Gilles Fanget, B. Dal'zotto, M. Ribeiro, Tadashi Kusumoto, Masumi Suetsugu, Ryotaro Hanawa
Proceedings Volume 4345, (2001)
KEYWORDS: Polymers, Etching, Lithography, Diffusion, FT-IR spectroscopy, Photoresist processing, Deep ultraviolet, Chemically amplified resists, Optical lithography, Statistical analysis

Showing 5 of 11 publications
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