Mr. Serge Tedesco
Program Manager at Commissariat a l'Energie Atomique
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | April 4, 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Lithography, Electrons, Silicon, Manufacturing, Reliability, Projection systems, Maskless lithography, High volume manufacturing, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Manufacturing, Photomasks, Computed tomography, Maskless lithography, Semiconducting wafers, Nanofabrication, Prototyping

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Electron beam lithography, Glasses, Molecules, Diffusion, Cadmium sulfide, Extreme ultraviolet lithography, Head-mounted displays, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Electron beam lithography, Etching, Polymers, Diffusion, Palladium, Critical dimension metrology, Semiconducting wafers, Prototyping, Industrial chemicals

PROCEEDINGS ARTICLE | August 24, 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, FT-IR spectroscopy, Optical lithography, Statistical analysis, Deep ultraviolet, Etching, Polymers, Diffusion, Photoresist processing, Chemically amplified resists

PROCEEDINGS ARTICLE | June 23, 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Lithography, Electron beam lithography, Deep ultraviolet, Diffusion, Scanning electron microscopy, Critical dimension metrology, Chlorine, Photoresist processing, Temperature metrology, Chemically amplified resists

Showing 5 of 11 publications
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