Serge Tedesco
Program Manager at Commissariat a l'Energie Atomique
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 4 April 2011 Paper
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Lithography, Electrons, Silicon, Manufacturing, Reliability, Projection systems, Maskless lithography, High volume manufacturing, Photoresist processing, Semiconducting wafers

Proceedings Article | 28 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Manufacturing, Photomasks, Computed tomography, Maskless lithography, Semiconducting wafers, Nanofabrication, Prototyping

Proceedings Article | 26 March 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Electron beam lithography, Glasses, Molecules, Diffusion, Cadmium sulfide, Extreme ultraviolet lithography, Head-mounted displays, Line edge roughness, Photoresist processing

Proceedings Article | 24 July 2002 Paper
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Electron beam lithography, Etching, Polymers, Diffusion, Palladium, Critical dimension metrology, Semiconducting wafers, Prototyping, Industrial chemicals

Proceedings Article | 24 August 2001 Paper
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, FT-IR spectroscopy, Optical lithography, Statistical analysis, Deep ultraviolet, Etching, Polymers, Diffusion, Photoresist processing, Chemically amplified resists

Showing 5 of 11 publications
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