The development of the electronic industry, with the further miniaturization of electronic components and the use of new materials puts forward increasingly stringent requirements for the quality, reliability and competitiveness of products. All this, in turn, dictates the creation of new technologies and technological processes. The microprocessing laser technologies at R&D production facility "Istok" named after Shokin " for the period 2003-2018, a series of modern automated laser technological installations of the "Caravel" type was created on the basis of industrial lasers and laser systems based on copper vapors and precision three-coordinate tables. This equipment with the diameter of the processing light spot of 10–20 μm and the peak power density of 10<sup>9</sup>-10<sup>11 </sup>W/cm<sup>2</sup> allows for efficient and high quality processing of foil (0.01-0.2 mm) and thin-sheet (0.2-1 mm) metal and the large range of non-metallic materials of microwave products.
In the present paper we present the results of a comparative analysis of pulsed copper vapour lasers with visible emission wavelengths of 510.6 and 578.2 nm and pulse duration of 10-30 ns and known types of technological lasers as well as the prospects for using the copper vapor laser for microprocessing of materials.