Dr. Sergei V. Postnikov
Process Engineer at ASELTA Nanographics
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Data modeling, Silicon, Manufacturing, Data processing, Photomasks, Optical proximity correction, Photoresist processing, Tolerancing

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Electron beam lithography, Metrology, Calibration, Etching, Metals, Manufacturing, Scanning electron microscopy, Photomasks, Critical dimension metrology, Model-based design

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Lithography, Optical lithography, Databases, Photonics, Photomasks, Optical proximity correction, Silicon photonics, Algorithm development, Model-based design

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Metrology, Logic, Optical lithography, Data modeling, Calibration, Manufacturing, Electroluminescence, Software development, Optical simulations, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Electronic design automation

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Photonic devices, Waveguides, Silicon, Scanning electron microscopy, Photonics, Optical proximity correction, SRAF, Silicon photonics, Resolution enhancement technologies

Showing 5 of 27 publications
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