Sergey Oshemkov
Senior Researcher at Carl Zeiss SMS Ltd
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | 11 September 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Semiconducting wafers, Photomasks, Critical dimension metrology, Quartz, Pulsed laser operation, Signal attenuation, Beam controllers, Deep ultraviolet, Metrology, Process control

Proceedings Article | 15 February 2008
Proc. SPIE. 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII
KEYWORDS: Ultrafast phenomena, Femtosecond phenomena, Glasses, Laser energy, Laser applications, Ultrafast lasers, Cavitation, Pulsed laser operation, Plasma, Liquids

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Polarization, Birefringence, Signal attenuation, Image processing, Scanners, Process control, Photomasks, Critical dimension metrology, Chemical elements, Semiconducting wafers

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Ultrafast phenomena, Scattering, Signal attenuation, Quartz, Laser applications, Laser scattering, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Deep ultraviolet, Signal attenuation, Glasses, Scanners, Manufacturing, Resistance, Photomasks, Excimer lasers, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Optical components, Deep ultraviolet, Signal attenuation, Quartz, Inspection, Laser scattering, Photomasks, Critical dimension metrology, Semiconducting wafers, Pulsed laser operation

Showing 5 of 7 publications
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