Dr. Sergey I. Zaitsev
Head of Lab at Institute of Microelectronics Technology-HPM
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Etching, Sputter deposition, Ions, 3D modeling, Ion beams, Microlens, Software development, Optical simulations, Process modeling, Isotropic etching

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mathematical modeling, Ultraviolet radiation, Computing systems, Computer simulations, 3D modeling, Numerical analysis, Finite difference methods, Nanoimprint lithography, Motion models, Photoresist processing

PROCEEDINGS ARTICLE | June 10, 2006
Proc. SPIE. 6260, Micro- and Nanoelectronics 2005
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Polymethylmethacrylate, Polymers, Molecules, Diffusion, Acquisition tracking and pointing, Thulium, Molecular interactions

PROCEEDINGS ARTICLE | May 31, 2006
Proc. SPIE. 6278, Seventh Seminar on Problems of Theoretical and Applied Electron and Ion Optics
KEYWORDS: Gold, Electron beams, Particles, Copper, Silicon, Silver, Gallium nitride, Monte Carlo methods, Optical simulations, Simulation of CCA and DLA aggregates

PROCEEDINGS ARTICLE | May 31, 2006
Proc. SPIE. 6278, Seventh Seminar on Problems of Theoretical and Applied Electron and Ion Optics
KEYWORDS: Gold, Scattering, Electrons, Laser scattering, Diagnostics, Computer simulations, Monte Carlo methods, Solids, Photonic integrated circuits, Simulation of CCA and DLA aggregates

PROCEEDINGS ARTICLE | May 31, 2006
Proc. SPIE. 6278, Seventh Seminar on Problems of Theoretical and Applied Electron and Ion Optics
KEYWORDS: Gold, Thin films, Statistical analysis, Scattering, Computer simulations, Monte Carlo methods, Solids, Ionization, Chlorine, Simulation of CCA and DLA aggregates

Showing 5 of 9 publications
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