Dr. Sergey V. Zakharov
at NAEXTSTREAM
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | June 7, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Plasma, Inspection, Metrology, Xenon, Multiplexing, Light sources, Ions, Tin, Capillaries

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Light sources, Data modeling, Capillaries, Photodiodes, Multiplexing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Modeling, Nanoparticles, Capillaries, Particles, Electrons, Ions, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Light sources, Metrology, Capillaries, Inspection, Photodiodes, Multiplexing, Photomasks, Extreme ultraviolet, EUV optics, Plasma

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Modeling, Light sources, Metrology, Capillaries, Electrons, Ions, Xenon, Ionization, Extreme ultraviolet, Plasma

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Light sources, Metrology, Electrons, Ions, Multiplexing, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma

Showing 5 of 6 publications
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