Dr. Serhiy Danylyuk
at RWTH Aachen Univ
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Metrology, Scanners, Spectroscopy, Reflectivity, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectance spectroscopy, Chemical elements, Algorithm development

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Nanostructures, Optical filters, Metrology, Optical lithography, Pellicles, Photoresist materials, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Optical design, Phase shifting, Holography, Photomasks, Extreme ultraviolet, Computational lithography, Photoresist processing, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Electron beam lithography, Modulation, Photoresist materials, Image quality, Photomasks, Extreme ultraviolet, Semiconducting wafers, Plasma, Phase shifts

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Mirrors, Spectroscopy, Silicon, Reflectivity, Pellicles, Reflectometry, Transmittance, Extreme ultraviolet, Reflectance spectroscopy, Carbon nanotubes

SPIE Journal Paper | October 17, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning electron microscopy, Ultraviolet radiation, Diffraction, Electron beam lithography, Spatial coherence

Showing 5 of 10 publications
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