Mrs. Sern Loong Ng
Applications Manager at Applied Materials South East Asia Pte Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 4, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Wafer-level optics, Data modeling, Etching, Pattern recognition, Scanning electron microscopy, Optical proximity correction, Optical alignment, Computer aided design, Target recognition, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Stereoscopy, Etching, Metals, Copper, Dielectrics, Nondestructive evaluation, Electron microscopes, 3D metrology, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Etching, Metals, Particles, Silicon, Inspection, Scanning electron microscopy, Bridges, Optical alignment, Semiconducting wafers, Yield improvement

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