Dr. Seth L. Cousin
at KMLabs Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 22 February 2021 Presentation
Fabian Holzmeier, Stefan Böttcher, Kevin Dorney, Esben Larsen, Thomas Nuytten, Dhirendra Singh, Michiel van Setten, Pieter Vanelderen, Clayton Bargsten, Seth Cousin, Daisy Raymondson, Eric Rinard, Rod Ward, Henry Kapteyn, Oleksiy Dyachenko, Raimund Kremzow, Marko Wietstruk, Geoffrey Pourtois, Paul van der Heide, John Petersen
Proceedings Volume 11610, 1161010 (2021) https://doi.org/10.1117/12.2595038
KEYWORDS: Lithography, Extreme ultraviolet lithography, Ultrafast phenomena, Photoemission spectroscopy, Coherence imaging, Semiconducting wafers, Radiometry, Extreme ultraviolet, Time resolved spectroscopy, Spectroscopy

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11610, 1161011 (2021) https://doi.org/10.1117/12.2595048
KEYWORDS: Lithography, Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Ultrafast phenomena, Photoresist materials, Yield improvement, Semiconductor manufacturing, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 30 March 2020 Presentation
J. Biegert, T. Sidiropolous, N. Di Palo, D. Rivas, S. Severino, S. Cousin, C. Cocchi, T. Danz, C. Draxl, M. Reduzzi, B. Buades, I. Leon, M. Hemmer, E. Pellegrin, J. Herrero Martin, S. Mañas-Valero, E. Coronado, M. Uemoto, K. Yabana, M. Schultze, S. Wall, A. Picon
Proceedings Volume 11346, 1134602 (2020) https://doi.org/10.1117/12.2557483

Proceedings Article | 26 March 2019 Presentation
Proceedings Volume 10959, 109590G (2019) https://doi.org/10.1117/12.2516827
KEYWORDS: Extreme ultraviolet, Stereoscopy, Reflectometry, 3D image processing

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