Dr. Seth Kruger
PhD Student at Univ at Albany
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Polymers, Amplifiers, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Diffusion, Glasses, Molecules, Neck

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Amplifiers, Fluorine, Line edge roughness, Extreme ultraviolet lithography, Lithography, Polymers, Photoresist materials, Polymerization, Temperature metrology, Extreme ultraviolet

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Polymers, Photoresist materials, Spectroscopy, Lithography, Polymer thin films, Diffusion, Surface conduction electron emitter displays, Ultraviolet radiation

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Amplifiers, Line edge roughness, Lithography, Extreme ultraviolet lithography, Molecules, Oxygen, Thermal modeling, Thermodynamics, Photoresist materials, Polymers

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Absorbance, Refractive index, Water, Sulfur, Oxygen, Refraction, Liquids, Argon, Potassium, Lithography

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Extreme ultraviolet lithography, Absorption, Extreme ultraviolet, Photoresist materials, Lithography, Semiconducting wafers, Light, Absorbance, Image quality, Reflectivity

Showing 5 of 7 publications
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