Seung-Chul Oh
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithium, Roads, Data modeling, Scanners, Optical alignment, Yield improvement, Overlay metrology

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Polarization, Chromium, Computer simulations, 3D modeling, Photomasks, Nanoimprint lithography, 3D displays, Device simulation, 3D image processing

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Reticles, Data modeling, Etching, Photomasks, Extreme ultraviolet, Double patterning technology, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 June 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Oxides, Thin films, Lithography, Reflectivity, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Thin film devices, Resolution enhancement technologies

Proceedings Article | 2 June 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Reflection, Etching, Sputter deposition, Electrodes, Metals, Platinum, Optical alignment, Semiconducting wafers, Signal detection, Overlay metrology

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