Seung-Hee Baek
at Synopsys Korea Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 28 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Databases, Manufacturing, Computer programming, 3D modeling, Photomasks, Optical proximity correction, Environmental sensing, Current controlled current source, Design for manufacturability

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Nano opto mechanical systems, Image processing, Image quality, Design for manufacturing, Image enhancement, Optical proximity correction, Nanoimprint lithography, Neodymium, Optimization (mathematics), Resolution enhancement technologies

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Etching, Particles, Photomasks, Optical proximity correction, Semiconducting wafers, Statistical modeling, Process modeling

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Etching, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development, Picture Archiving and Communication System

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Diffractive optical elements, Physics, Photomasks, Critical dimension metrology, Acoustics, Photoresist processing, Semiconducting wafers, Standards development, Temperature metrology

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Etching, Dry etching, Resistance, Scanning electron microscopy, Photomasks, Logic devices, Mask making, Critical dimension metrology, Line edge roughness, Photoresist processing

Showing 5 of 7 publications
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