Dr. Seung-Hune Yang
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 4 April 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Composites, Electroluminescence, Optical proximity correction, Signal detection, Product engineering, Standards development, Resolution enhancement technologies

Proceedings Article | 19 March 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Lithography, Optical lithography, Polymers, Photomasks, Machine learning, Directed self assembly, Optical proximity correction, Electrical engineering, Global Positioning System, 193nm lithography

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Diffraction, Reticles, Logic, Lenses, Wavefronts, Zernike polynomials, Photomasks, Logic devices, Binary data

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Metrology, Data modeling, Calibration, Atomic force microscopy, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Data conversion, Optical calibration, Instrument modeling

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Electron beams, Error analysis, Monte Carlo methods, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Neodymium, Semiconducting wafers

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Principal component analysis, Data modeling, Calibration, Logic devices, Optical proximity correction, Semiconducting wafers, Optics manufacturing, Statistical modeling, Model-based design

Showing 5 of 26 publications
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