Dr. Seung-Hune Yang
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 4 April 2017 Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Optical proximity correction, Lithography, Resolution enhancement technologies, Optical lithography, Logic, Standards development, Electroluminescence, Metals, Product engineering, Composites, Signal detection

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Global Positioning System, Lithography, Machine learning, Photomasks, Polymers, Optical lithography, Optical proximity correction, 193nm lithography, Electrical engineering, Directed self assembly

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Wavefronts, Photomasks, Diffraction, Reticles, Zernike polynomials, Binary data, Logic, Logic devices, Lenses, Lithography

Proceedings Article | 9 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Data modeling, Scanning electron microscopy, Atomic force microscopy, Calibration, Optical proximity correction, Optical calibration, Instrument modeling, Critical dimension metrology, Metrology, Data conversion

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Photomasks, Critical dimension metrology, Source mask optimization, Electron beams, Optical proximity correction, Neodymium, Error analysis, Lithography, Semiconducting wafers, Monte Carlo methods

Showing 5 of 26 publications
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