Mr. Seung Keun Oh
Leader ArF Team at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 3, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Polymerization, Line width roughness, Palladium, Promethium, Immersion lithography, Line edge roughness, Photoresist processing, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Lithography, Polymers, Silicon, Manufacturing, Photoresist materials, Immersion lithography, Fluorine, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Optical lithography, Polymers, Water, Glasses, Molecules, Digital watermarking, Molecular interactions, Photoresist processing, Polymer thin films, Liquids

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Polymers, Molecules, Diffusion, Photoresist materials, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Refractive index, Optical lithography, Polymers, Water, Diffusion, Photoresist materials, Immersion lithography, Photoresist processing, Polymer thin films, Liquids

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Semiconductors, Lithography, Polymers, Diffusion, Photoresist materials, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Polymer thin films, Temperature metrology

Showing 5 of 7 publications
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