Dr. Seung-Wook Park
Director at Hanyang Univ
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconductors, Lithography, Etching, Polymers, Photoresist materials, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Optical lithography, Diffusion, Control systems, Photoresist materials, Photomasks, Critical dimension metrology, Photoresist processing, Phase shifts, Chemically amplified resists

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Optical lithography, Cadmium, Control systems, Process control, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Optical arrays

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Semiconductors, Reticles, Air contamination, Crystals, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 22 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Mathematical modeling, Semiconductors, Lithography, Electronics, Optical lithography, Capillaries, Applied physics, Semiconducting wafers, Liquids, Chemically amplified resists

Proceedings Article | 21 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Deep ultraviolet, Ultraviolet radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Adhesives, Autoregressive models, Liquids

Showing 5 of 18 publications
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