Shad E. Hedges
at Photronics Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Reticles, Cadmium, Defect detection, Detection and tracking algorithms, Opacity, Argon, Inspection, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Reticles, Defect detection, Opacity, Databases, Inspection, Feature extraction, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Defect detection, Opacity, Databases, Inspection, Feature extraction, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

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