Shady Elshafie
TD Global Support Engineer
SPIE Involvement:
Publications (6)

Proceedings Article | 5 October 2016 Paper
Proceedings Volume 9985, 998527 (2016)
KEYWORDS: Optical proximity correction, Optical properties, Algorithm development, Optical alignment, Geometrical optics, Wafer-level optics, Computer simulations, Semiconducting wafers, Photomasks, Lithography

Proceedings Article | 15 March 2012 Paper
Jae-Hyun Kang, Naya Ha, Joo-Hyun Park, Byung-Moo Kim, Seung Weon Paek, Hungbok Choi, Kee Sup Kim, Ahmed Mohy, Shady Abdelwahed, Mohamed Imam
Proceedings Volume 8327, 83270P (2012)
KEYWORDS: Semiconducting wafers, Metals, Process modeling, Image processing, Design for manufacturing, Chemical mechanical planarization, Optical proximity correction, 3D modeling, Photovoltaics, Scanning electron microscopy

Proceedings Article | 4 March 2010 Paper
Young-Seok Woo, Woon-Hyuk Choi, Beom-Seok Seo, Yoo-Hyon Kim, Vladislav Liubich, Shady Abdelwahed, Juhwan Kim, James Word, Jong-Won Lee
Proceedings Volume 7640, 76401F (2010)
KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Critical dimension metrology, Bridges, Resolution enhancement technologies, Semiconducting wafers, Lithographic illumination, Tolerancing, Computer simulations

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72742I (2009)
KEYWORDS: Optical proximity correction, Photomasks, Resolution enhancement technologies, Semiconducting wafers, Optical lithography, Lithography, Image processing, Manufacturing, Silicon, Microelectronics

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 727423 (2009)
KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Lithography, Semiconducting wafers, Scanning electron microscopy, Photomasks, Image processing, Critical dimension metrology

Showing 5 of 6 publications
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