Mr. Shady Elshafie Profile

Shady Elshafie

TD Global Support Engineer

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Publications (6)

Proceedings Article | 5 October 2016 Paper

OPC model sampling evaluation and weakpoint “in-situ” improvement

Nan Fu, Shady Elshafie, Guoxiang Ning, Stefan Roling

Proceedings Volume 9985, 998527 (2016) https://doi.org/10.1117/12.2240934

KEYWORDS: Optical proximity correction, Optical properties, Algorithm development, Optical alignment, Geometrical optics, Wafer-level optics, Computer simulations, Semiconducting wafers, Photomasks, Lithography

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Proceedings Article | 15 March 2012 Paper

Thickness-aware LFD for the hotspot detection induced by topology

Jae-Hyun Kang, Naya Ha, Joo-Hyun Park, Byung-Moo Kim, Seung Weon Paek, Hungbok Choi, Kee Sup Kim, Ahmed Mohy, Shady Abdelwahed, Mohamed Imam

Proceedings Volume 8327, 83270P (2012) https://doi.org/10.1117/12.917998

KEYWORDS: Semiconducting wafers, Metals, Process modeling, Image processing, Design for manufacturing, Chemical mechanical planarization, Optical proximity correction, 3D modeling, Photovoltaics, Scanning electron microscopy

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Proceedings Article | 4 March 2010 Paper

Optical proximity correction enhancement by using model based fragmentation approaches

Young-Seok Woo, Woon-Hyuk Choi, Beom-Seok Seo, Yoo-Hyon Kim, Vladislav Liubich, Shady Abdelwahed, Juhwan Kim, James Word, Jong-Won Lee

Proceedings Volume 7640, 76401F (2010) https://doi.org/10.1117/12.848447

KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Critical dimension metrology, Bridges, Resolution enhancement technologies, Semiconducting wafers, Lithographic illumination, Tolerancing, Computer simulations

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Proceedings Article | 16 March 2009 Paper

Pre-OPC layout decomposition for improved image fidelity

Shady Abdelwahed, Rami Fathy, Jae Hyun Kang, Jong Doo Kim, Youngmi Kim

Proceedings Volume 7274, 72742I (2009) https://doi.org/10.1117/12.816825

KEYWORDS: Optical proximity correction, Photomasks, Resolution enhancement technologies, Semiconducting wafers, Optical lithography, Lithography, Image processing, Manufacturing, Silicon, Microelectronics

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Proceedings Article | 16 March 2009 Paper

Smart data filtering for enhancement of model accuracy

Shady Abdelwahed, Jae Hyun Kang, Jaeyoung Choi, Jong Doo Kim, Hyesung Lee, Sungho Jun, Youngmi Kim

Proceedings Volume 7274, 727423 (2009) https://doi.org/10.1117/12.814153

KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Lithography, Semiconducting wafers, Scanning electron microscopy, Photomasks, Image processing, Critical dimension metrology

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Proceedings Article | 13 March 2009 Paper

Implementing a framework to generate a unified OPC database from different EDA vendors for 45nm and beyond

Shady Abdelwahed, Mohamed Al-Iman, Rami Fathy, Nader Hindawy, Jochen Schacht, Regina Shen, Chia Wei Huang, Pei Ru Tsai, Te Hung Wu, Chuen Huei Yang

Proceedings Volume 7275, 72751O (2009) https://doi.org/10.1117/12.816281

KEYWORDS: Optical proximity correction, Electronic design automation, Photomasks, Semiconducting wafers, Data modeling, SRAF, Visualization, Wafer-level optics, Databases, Lithography

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Showing 5 of 6 publications

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