Dr. Shailendra N. Srivastava
Scientist at Univ of Illinois
SPIE Involvement:
Author
Publications (26)

SPIE Journal Paper | April 7, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Tin, Plasma, Ions, Hydrogen, Etching, Extreme ultraviolet, In situ metrology, Extreme ultraviolet lithography, Data modeling, Reflection

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Etching, Chemical species, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Probability theory, EUV optics, Plasma, Tin, Oxidation

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Etching, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Plasma etching, Extreme ultraviolet lithography, Process modeling, Plasma, Tin

PROCEEDINGS ARTICLE | April 8, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Methane, Contamination, Etching, Hydrogen, Oxygen, Extreme ultraviolet, Antennas, Plasma, Tin

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Scanners, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma systems, Plasma, Tin

SPIE Journal Paper | June 29, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

Showing 5 of 26 publications
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