Dr. Shailendra N. Srivastava
Scientist at Univ of Illinois
SPIE Involvement:
Author
Publications (26)

SPIE Journal Paper | 7 April 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Tin, Plasma, Ions, Hydrogen, Etching, Extreme ultraviolet, In situ metrology, Extreme ultraviolet lithography, Data modeling, Reflection

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Etching, Chemical species, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Probability theory, EUV optics, Plasma, Tin, Oxidation

Proceedings Article | 6 April 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Etching, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Plasma etching, Extreme ultraviolet lithography, Process modeling, Plasma, Tin

Proceedings Article | 8 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Methane, Contamination, Etching, Hydrogen, Oxygen, Extreme ultraviolet, Antennas, Plasma, Tin

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Scanners, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma systems, Plasma, Tin

Showing 5 of 26 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top