Dr. Shane R. Palmer
Senior Principal Scientist at Nikon Research Corp of America
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
Optical and Etch Proximity Correction , Lithographic Simulation , Electron Beam Technology , Electromagnetic Scattering , Metrology
Publications (18)

SPIE Journal Paper | March 30, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Scanners, Optical proximity correction, Photomasks, Lithography, Metals, Error analysis, Overlay metrology, Semiconducting wafers, Statistical analysis, Optical lithography

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical design, Optical lithography, Statistical analysis, Etching, Image processing, Scanners, Ions, Monte Carlo methods, Computational lithography, Optical proximity correction, Optical alignment, Semiconducting wafers, Integrated circuit design, Performance modeling, 193nm lithography

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Point spread functions, Reticles, Lithographic illumination, Imaging systems, Computer simulations, Ray tracing, Source mask optimization, Critical dimension metrology, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Polarization, Imaging systems, Image resolution, Scanning electron microscopy, Finite element methods, Photomasks, Immersion lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Mathematical modeling, Lithography, Data modeling, Polarization, Silicon, Photomasks, Immersion lithography, Optical proximity correction, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Polarization, Sensors, Polarizers, Attenuators, Photomasks, Laser beam diagnostics, Binary data, Phase shifts, Diffraction gratings

Showing 5 of 18 publications
Conference Committee Involvement (3)
Photomask Technology
11 September 2017 | Monterey, California, United States
SPIE Photomask
2 February 2016 |
Internation Conference on Electron, Ion, Photon Beam and Nanofabrication Technology
28 May 2012 |
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