Dr. Shang-Chieh Chien
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Light sources, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Line width roughness, Aluminum, Extreme ultraviolet lithography, Optical proximity correction, Light

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Contamination, Polymers, Scanners, Electroluminescence, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Statistical modeling

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Lithography, Contamination, Polymers, Scanners, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

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