Shangliang Jiang
SPIE Involvement:
Publications (6)

SPIE Journal Paper | 3 November 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Optical proximity correction, Metals, Photomasks, Algorithm development, Semiconducting wafers, Binary data, Image processing, Resolution enhancement technologies, Optical lithography, SRAF

Proceedings Article | 15 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Data modeling, Manufacturing, Photomasks, Machine learning, Integrated circuits, Associative arrays, Optical proximity correction, Algorithm development, Model-based design, Chemical mechanical planarization

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Electron beams, Data modeling, Scattering, Distortion, Photomasks, Optical proximity correction, Mask making, Algorithm development, Semiconducting wafers, Model-based design

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Electron beams, Logic, Detection and tracking algorithms, Data modeling, Computer simulations, Photomasks, Associative arrays, Optical proximity correction, Semiconducting wafers, Model-based design

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Optical lithography, Computer programming, Photomasks, Transistors, Beam shaping, Optical proximity correction, SRAF, Critical dimension metrology, Vestigial sideband modulation, Resolution enhancement technologies

Showing 5 of 6 publications
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