Dr. Shannon B. Hill
Physicist at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Oxides, Multilayers, Annealing, Silicon, Resistance, Reflectivity, Reflectometry, Extreme ultraviolet, Extreme ultraviolet lithography, Oxidation

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Electron beams, Contamination, Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Semiconducting wafers, Standards development, Temperature metrology

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Mirrors, Contamination, Scanners, Molecules, Manufacturing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Contamination, Photons, Electrons, Photoresist materials, Extreme ultraviolet, Beam shaping, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | March 26, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Scanners, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Molecules, Spectroscopic ellipsometry, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Ruthenium, EUV optics

Showing 5 of 15 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top