Dr. Shannon B. Hill
Physicist at National Institute of Standards and Technology
SPIE Involvement:
Publications (15)

Proceedings Article | 16 March 2015 Paper
Proceedings Volume 9422, 94220K (2015) https://doi.org/10.1117/12.2085934
KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Annealing, Resistance, Oxides, Reflectometry, Silicon, Oxidation

Proceedings Article | 13 March 2015 Paper
Soichi Inoue, Eishi Shiobara, Takeshi Sasami, Isamu Takagi, Yukiko Kikuchi, Toru Fujimori, Shinya Minegishi, Robert Berg, Thomas Lucatorto, Shannon Hill, Charles Tarrio, Ivan Pollentier, Yen-Chih Lin, Yu-Jen Fan, Dominic Ashworth
Proceedings Volume 9422, 942212 (2015) https://doi.org/10.1117/12.2085700
KEYWORDS: Semiconducting wafers, Contamination, Picosecond phenomena, Temperature metrology, Extreme ultraviolet, Molecules, Extreme ultraviolet lithography, Electron beams, Standards development, Lithography

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86790K (2013) https://doi.org/10.1117/12.2011541
KEYWORDS: Semiconducting wafers, Contamination, Electrons, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Photons, Mirrors, Beam shaping, EUV optics

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 867920 (2013) https://doi.org/10.1117/12.2011663
KEYWORDS: Semiconducting wafers, Carbon, Extreme ultraviolet, Contamination, Photoresist materials, Extreme ultraviolet lithography, Mirrors, Molecules, Manufacturing, Scanners

Proceedings Article | 26 March 2011 Paper
S. Grantham, C. Tarrio, S. Hill, L. Richter, T. Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Proceedings Volume 7969, 79690K (2011) https://doi.org/10.1117/12.879519
KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Photoresist materials, Extreme ultraviolet, Contamination, Scanners, Electrons, Mirrors, Carbon, Synchrotrons

Showing 5 of 15 publications
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