Shanshan Mao
at Beijing Institute of Technology
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | July 24, 2018
Proc. SPIE. 10827, Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018)
KEYWORDS: Lithography, Monochromatic aberrations, Error analysis, Manufacturing, Wavefronts, Distortion, Image quality, Objectives, Tolerancing, Assembly tolerances

SPIE Journal Paper | February 11, 2017
OE Vol. 56 Issue 02
KEYWORDS: Objectives, Deep ultraviolet, Lithography, Combined lens-mirror systems, Mirrors, Lens design, Lithium, Optical engineering, Optical design, Refractor telescopes

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