Sharon Aharon
at KLA-Tencor Israel
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Diffraction, Visible radiation, Light sources, Imaging technologies, Optical testing, Signal processing, Integrated circuits, Semiconducting wafers, Electromagnetism, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Statistical analysis, Image segmentation, Manufacturing, Scanning electron microscopy, Process control, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top