Dr. Shaunee Y. Cheng
Manager, Metrology & Litho Process Equipment Dev at IMEC
SPIE Involvement:
Conference Program Committee | Author
Publications (57)

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Optical lithography, Data modeling, Silica, Scanners, Data acquisition, Process control, Photomasks, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Metrology, Etching, Inspection, Optical metrology, Process control, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Optical lithography, Etching, Metals, Scanners, Copper, Double patterning technology, Optical alignment, Neodymium, Chemical mechanical planarization, Back end of line

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, Optical lithography, Etching, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Metrology, Cadmium, Calibration, Scanning electron microscopy, Scatterometry, 3D metrology, Optical proximity correction, Critical dimension metrology, Scatter measurement

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconductors, Metrology, Etching, Scanning electron microscopy, Image quality, Line width roughness, Image enhancement, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Showing 5 of 57 publications
Conference Committee Involvement (6)
Metrology, Inspection, and Process Control for Microlithography XXVIII
24 February 2014 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVII
25 February 2013 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVI
13 February 2012 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXV
28 February 2011 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIV
22 February 2010 | San Jose, California, United States
Showing 5 of 6 published special sections
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