Dr. Shayak Banerjee
SPIE Involvement:
Publications (9)

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Critical dimension metrology, Silicon, Etching, Semiconducting wafers, Optical proximity correction, Reflectivity, Near field optics, Computational lithography, Optical lithography, Data modeling

SPIE Journal Paper | 11 June 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Optical proximity correction, Photomasks, Nanoimprint lithography, Lithography, Detection and tracking algorithms, Optimization (mathematics), Metals, Semiconducting wafers, Photovoltaics, Source mask optimization

Proceedings Article | 29 March 2013
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Diffraction, Lithography, Optical proximity correction, Model-based design, Source mask optimization, Fourier transforms, Photomasks, Detection and tracking algorithms, Nanoimprint lithography, Resolution enhancement technologies

SPIE Journal Paper | 13 February 2013
JM3 Vol. 12 Issue 01
KEYWORDS: Tolerancing, Transistors, Lithography, Optical proximity correction, Photomasks, Logic, Critical dimension metrology, Manufacturing, Photovoltaics, Image processing

Proceedings Article | 4 April 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Optical proximity correction, Nanoimprint lithography, Lithography, Photomasks, Model-based design, Metals, Image processing, Resolution enhancement technologies, Detection and tracking algorithms, Integrated modeling

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Image processing, Motion analysis, Source mask optimization, Semiconducting wafers, System on a chip, Photovoltaics, Printing

Showing 5 of 9 publications
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