Sheeba J. Panayil
Sales Representative at Applied Materials Inc
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Infrared search and track, Etching, Quartz, Particles, Ions, Chromium, Photomasks, Optical proximity correction, Critical dimension metrology, Reactive ion etching

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Infrared search and track, Etching, Quartz, Particles, Ions, Chromium, Photomasks, Optical proximity correction, Critical dimension metrology, Reactive ion etching

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Etching, Quartz, Ions, Photomasks, Reactive ion etching, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Infrared search and track, Metrology, Etching, Particles, Chromium, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Etching, Quartz, Polymers, Ions, Photomasks, Reactive ion etching, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Metrology, Etching, Particles, Chromium, Photomasks, Plasma etching, Optical proximity correction, Critical dimension metrology, Photoresist processing, Resolution enhancement technologies

Showing 5 of 8 publications
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