Shen-Hung Chen
at United Microelectronic Corp
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Diffusion, Image registration, Photomasks, Line width roughness, Double patterning technology, Manganese, Critical dimension metrology, Semiconducting wafers, Overlay metrology

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