Dr. Chin-Wei Shen
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Diffractive optical elements, Opacity, Particles, Inspection, Photomasks, SRAF, Cavitation, Acoustics, Binary data, Mask cleaning

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Quartz, Particles, Silicon, Manufacturing, Inspection, Photomasks, Semiconductor manufacturing, Chemical analysis, Critical dimension metrology, Mask cleaning

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