Dr. Sheng-Yung Chen
Senior Engineer at HMI
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Electron beam lithography, Metrology, Optical lithography, Inspection, Ion beams, Bridges, Helium, Critical dimension metrology, Photoresist processing

SPIE Journal Paper | 22 August 2012
JM3 Vol. 11 Issue 3
KEYWORDS: Electron beam lithography, Monte Carlo methods, Line edge roughness, Computer simulations, Critical dimension metrology, Transistors, Optical simulations, Diffusion, Optimization (mathematics), Point spread functions

Proceedings Article | 14 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Sensors, Silicon, Detector arrays, Monte Carlo methods, Optical simulations, Semiconducting wafers, Signal detection

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