Dr. SherJang Singh
Principal Member of Technical Staff at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (20)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Carbon, Reticles, Optical lithography, Contamination, Air contamination, Ions, Reflectivity, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Atmospheric particles, Ruthenium

PROCEEDINGS ARTICLE | October 3, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Reticles, Ultraviolet radiation, Mercury, Lamps, Reflectivity, Oxygen, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Argon, Particles, Energy transfer, Gases, Photomasks, SRAF, Cavitation, Acoustics, Stereolithography, Liquids

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Particles, Ions, Chemistry, Photomasks, SRAF, Cavitation, Acoustics, Thermodynamics, Mask cleaning, Liquids

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Reticles, Particles, Chemistry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Cavitation, Acoustics, Ruthenium

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Particles, Ions, Chemistry, Inspection, Photomasks, SRAF, Cavitation, Acoustics, Stereolithography, Liquids

Showing 5 of 20 publications
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