Dr. Shiang Bau Wang
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Metrology, Calibration, Silicon, Control systems, Transmission electron microscopy, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Instrument modeling

Proceedings Article | 23 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Oxides, Signal to noise ratio, Metrology, Electron microscopes, Scanning electron microscopy, Time metrology, Photomasks, Line width roughness, Semiconductor manufacturing, Line edge roughness

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Statistical analysis, Spatial frequencies, Etching, Image processing, Transmission electron microscopy, Line width roughness, Optical alignment, Line edge roughness, Semiconducting wafers

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