Dr. Shigehiro Hara
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Point spread functions, Electron beams, Data modeling, Scattering, Chromium, Monte Carlo methods, Photomasks, Extreme ultraviolet, Tantalum, Process modeling

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Metrology, Optical lithography, Scattering, Manufacturing, Time metrology, Photomasks, Extreme ultraviolet, Computational lithography, Critical dimension metrology, EUV optics

PROCEEDINGS ARTICLE | May 11, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Monochromatic aberrations, Electron beams, Manufacturing, Control systems, Photomasks, Beam shaping, Electron beam melting, Line edge roughness, Photoresist processing, Standards development

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Electron beams, Error analysis, Manufacturing, Photomasks, Optical proximity correction, Electron beam melting, Line edge roughness, Data conversion, Electro optical systems

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Semiconductors, Nanotechnology, Data compression, Manufacturing, Printing, Photomasks, Data conversion, Prototyping, Vestigial sideband modulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Semiconductors, Data modeling, Manufacturing, Data processing, Photomasks, Optical proximity correction, Data conversion, Vestigial sideband modulation, Resolution enhancement technologies, Instrument modeling

Showing 5 of 10 publications
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