Dr. Shigeki Hattori
at Toshiba Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Etching, Polymers, Molecules, Quantum efficiency, Resistance, Oxygen, Scanning electron microscopy, Line width roughness, Photoresist processing

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Thin films, Lithography, Microscopes, Electron beams, Molecules, Crystals, Silicon, Scanning electron microscopy, Solids, Line edge roughness

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