Prof. Shigeki Mori
at Hitachi Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 22, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Lithography, Polymers, Molecules, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Molybdenum, Chromatography

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Scattering, Silicon, Monte Carlo methods, Software development, Photomasks, Optical proximity correction, Analytical research, Critical dimension metrology, Semiconducting wafers, Projection lithography

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Monochromatic aberrations, Electron beams, Backscatter, Data processing, Image classification, Double patterning technology, Optical aberrations, Data corrections, Projection lithography

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