Dr. Shigeo Irie
at Shin-Etsu Chemical Co Ltd
SPIE Involvement:
Author
Publications (28)

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Logic, Lithographic illumination, Photomasks, Logic devices, Source mask optimization, Optical proximity correction, Halftones, Binary data, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | March 13, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Logic, Printing, Lab on a chip, Transmittance, Photomasks, Image enhancement, Immersion lithography, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Contamination, Laser development, Laser irradiation, Pellicles, Transmittance, Photomasks, Vacuum ultraviolet, Fluorine, Semiconducting wafers

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Microelectromechanical systems, Lithography, Transparency, Etching, Chemical species, Polymers, Resistance, Photoresist materials, Polymerization, Fluorine

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Etching, Dry etching, Polymers, Scanners, Scanning electron microscopy, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Transparency, Etching, Chemical species, Dry etching, Polymers, Resistance, Plasma etching, Fluorine, Absorption

Showing 5 of 28 publications
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