Shigeru Hirukawa
Assistant Manager at Nikon Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (19)

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Light sources, Logic, Optical lithography, Lithographic illumination, Seaborgium, Imaging systems, Photomasks, Source mask optimization, Excel

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Diffraction, Reticles, Calibration, Scanners, Image analysis, Critical dimension metrology, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Double patterning technology, Photomasks, Etching, Reticles, Lithography, Optical lithography, Semiconducting wafers, Image processing, Photoresist processing, Deposition processes

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Reticles, Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Deposition processes, Photoresist processing, Semiconducting wafers

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Light sources, Data modeling, Scanners, Spectroscopy, Optical proximity correction, Critical dimension metrology, Molybdenum, Fluorine, Fiber optic illuminators

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Lithographic illumination, Polarization, Image processing, Wave plates, Photomasks, Line width roughness, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

Showing 5 of 19 publications
Conference Committee Involvement (1)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
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