Shigeru Nakajima
at Tokyo Electron AT Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Etching, Oxygen, Photomasks, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Photoresist processing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Fabrication, Lithography, Logic, Silica, Etching, Photomasks, Double patterning technology, Reactive ion etching, Stationary wavelet transform, Photoresist processing

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical lithography, Silica, Etching, Photoresist materials, Atomic layer deposition, Line width roughness, Double patterning technology, Photoresist processing, Resolution enhancement technologies

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