Mr. Shigeyuki Uzawa Profile

Shigeyuki Uzawa

Chief Executive at Canon Inc

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Publications (7)

Proceedings Article | 18 March 2009 Paper

Development status of Canon's full-field EUVL tool

Takayuki Hasegawa, Shigeyuki Uzawa, Tokuyuki Honda, Yoshinari Higaki, Akira Miyake, Hideki Morishima

Proceedings Volume 7271, 72711Y (2009) https://doi.org/10.1117/12.813465

KEYWORDS: Carbon, Extreme ultraviolet, Extreme ultraviolet lithography, Mirrors, Protactinium, Nanoimprint lithography, Critical dimension metrology, Projection systems, Photomasks, Polishing

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Proceedings Article | 27 March 2008 Paper

Study of system performance in SFET

Naosuke Nishimura, Gaku Takahashi, Toshihiko Tsuji, Hideki Morishima, Kazuhiko Kajiyama, Shigeyuki Uzawa

Proceedings Volume 6921, 69211C (2008) https://doi.org/10.1117/12.771952

KEYWORDS: Fiber optic illuminators, Semiconducting wafers, Light sources, Photomasks, Metals, Extreme ultraviolet lithography, Nanoimprint lithography, Sensors, Error analysis, Extreme ultraviolet

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Proceedings Article | 26 March 2008 Paper

Canon's development status of EUVL technologies

Shigeyuki Uzawa, Hiroyoshi Kubo, Yoshinori Miwa, Toshihiko Tsuji, Hideki Morishima, Kazuhiko Kajiyama, Takayuki Hasegawa

Proceedings Volume 6921, 69210N (2008) https://doi.org/10.1117/12.769894

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Carbon, Photomasks, Particles, Projection systems, Contamination, Reflectivity, Laser damage threshold, Oxidation

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Proceedings Article | 13 March 2007 Paper

Path to the HVM in EUVL through the development and evaluation of the SFET

Shigeyuki Uzawa, Hiroyoshi Kubo, Yoshinori Miwa, Toshihiko Tsuji, Hideki Morishima

Proceedings Volume 6517, 651708 (2007) https://doi.org/10.1117/12.711650

KEYWORDS: Mirrors, Projection systems, Extreme ultraviolet lithography, Photomasks, Ion beam finishing, Wavefronts, Semiconducting wafers, Ion beams, Visible radiation, Reflectivity

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Proceedings Article | 28 May 2004 Paper

0.85-NA ArF scanner: advancing features and performances

Atsushi Namba, Shigeyuki Uzawa, Kenichi Kotoku

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544239

KEYWORDS: Reticles, Semiconducting wafers, Sensors, Scanners, Projection systems, Cadmium, Interferometers, Overlay metrology, Control systems, Optical lithography

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Proceedings Article | 26 June 2003 Paper

Next-generation scanner for sub-100-nm lithography

Itaru Fujita, Fumio Sakai, Shigeyuki Uzawa

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485507

KEYWORDS: Reticles, Semiconducting wafers, Scanners, Lithography, Interferometers, Cadmium, Optical lithography, Optical alignment, Sensors, Control systems

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Proceedings Article | 26 July 1999 Paper

150-nm generation lithography equipment

Nobuyoshi Deguchi, Shigeyuki Uzawa

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354359

KEYWORDS: Semiconducting wafers, Lithography, Reticles, Lithographic illumination, Scanners, Imaging systems, Distortion, Overlay metrology, Optical alignment, Semiconductor manufacturing

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Showing 5 of 7 publications

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