Shih-Chun Wang
at Industrial Technology Research Institute
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Critical dimension metrology, Scatterometry, Refractive index, Scatter measurement, Optical properties, Measurement devices, Reflectivity, Semiconductor manufacturing, Process control, Metrology

Proceedings Article | 15 September 2005
Proc. SPIE. 5908, Optical Information Systems III
KEYWORDS: Light scattering, Scatterometry, Inverse optics, Diffraction, Metrology, Scattering, Critical dimension metrology, Diffraction gratings, Overlay metrology, Optical testing

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Overlay metrology, Microscopes, Reflectance spectroscopy, Reflectivity, Scatterometry, Silicon, Metrology, Spectroscopy, Diffraction gratings, Light

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Scattering, Scatterometry, Critical dimension metrology, Laser scattering, Overlay metrology, Light scattering, Scatter measurement, Optical design, Interference (communication), Semiconducting wafers

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