Dr. Shih En Tseng
at ASML Taiwan Ltd
SPIE Involvement:
Publications (13)

Proceedings Article | 1 December 2022 Paper
Proceedings Volume 12293, 122930C (2022) https://doi.org/10.1117/12.2642302
KEYWORDS: Photomasks, Semiconducting wafers, Calibration, Data modeling, Line width roughness, Logic, Optical lithography, Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12052, 120520G (2022) https://doi.org/10.1117/12.2614225
KEYWORDS: Source mask optimization, Metals, Nanoimprint lithography, Extreme ultraviolet, Photomasks, Logic, Optical lithography, Molybdenum, SRAF, Extreme ultraviolet lithography

Proceedings Article | 2 April 2020 Presentation + Paper
Proceedings Volume 11323, 113231L (2020) https://doi.org/10.1117/12.2552888
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Logic, Optical lithography, Photomasks, Resolution enhancement technologies, Source mask optimization, Optical proximity correction, Metals, Nanoimprint lithography

Proceedings Article | 16 October 2017 Presentation + Paper
Proceedings Volume 10450, 1045005 (2017) https://doi.org/10.1117/12.2281132
KEYWORDS: Photomasks, SRAF, Extreme ultraviolet, Manufacturing, Optical proximity correction, Extreme ultraviolet lithography, Metals, Inspection, Scanning electron microscopy, Metrology

Proceedings Article | 16 March 2016 Paper
Proceedings Volume 9781, 978107 (2016) https://doi.org/10.1117/12.2220019
KEYWORDS: Metals, Extreme ultraviolet, Optical lithography, Back end of line, Line edge roughness, Image processing, Image segmentation, Lithography, Extreme ultraviolet lithography, Printing

Showing 5 of 13 publications
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