Dr. Shih En Tseng
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 2 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Logic, Optical lithography, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Resolution enhancement technologies

Proceedings Article | 16 October 2017 Presentation + Paper
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Metrology, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF

Proceedings Article | 16 March 2016 Paper
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Metals, Image segmentation, Image processing, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Back end of line

Proceedings Article | 22 April 2011 Paper
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Logic, 3D acquisition, Manufacturing, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Critical dimension metrology

Proceedings Article | 12 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Reticles, Diffractive optical elements, Etching, Scanners, Error analysis, Photomasks, Double patterning technology, Source mask optimization

Showing 5 of 11 publications
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