Shih-Ming Chang
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Monte Carlo methods, Photomasks, Beam shaping, Critical dimension metrology, Model-based design, Process modeling, Vestigial sideband modulation

PROCEEDINGS ARTICLE | March 28, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Electron beam lithography, Scattering, Lenses, Silicon, Laser scattering, Maskless lithography, Modulation transfer functions, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Electron beam lithography, Scattering, Electrons, Laser scattering, Image resolution, Monte Carlo methods, Line width roughness, Optical simulations, Raster graphics

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Logic, Image processing, Image analysis, Scanning electron microscopy, Photomasks, Image enhancement, Optical proximity correction, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Etching, Error analysis, Manufacturing, Inspection, Control systems, Software development, Photomasks, Semiconductor manufacturing, Critical dimension metrology

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Optical lithography, Cadmium, Etching, Dry etching, Manufacturing, Inspection, Control systems, Photomasks, Mask making, Critical dimension metrology

Showing 5 of 6 publications
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