Shih-Ping Lu
at Rexchip Electronics Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Air contamination, Particles, Inspection, Scanning electron microscopy, Printing, Wafer inspection, Photomasks, Semiconductor manufacturing, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Defect detection, Deep ultraviolet, Air contamination, Particles, Reliability, Inspection, Chromium, Photomasks, Dysprosium, Semiconducting wafers

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