Mr. Shin-Ichiro Hirai
at Canon Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Silicon, Photomasks, Optical alignment, Plating, Critical dimension metrology, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Semiconductors, Lithography, Etching, Electrodes, Silicon, Distortion, Optical alignment, Plating, Semiconducting wafers, Wafer bonding

PROCEEDINGS ARTICLE | October 18, 2004
Proc. SPIE. 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
KEYWORDS: Microscopes, Mirrors, Polishing, Spatial frequencies, Glasses, X-rays, Surface roughness, Objectives, X-ray imaging, Surface finishing

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