For multi-purpose applications such as advanced LSIs, photonics, MEMS, and other nano- fabrications, it is important
for electron beam (EB) writers that handle the various substrates with their own single mechanical platform. We have
been developing the adjusting pallet function both 200mm and 300mm bases to satisfy this requirement. By analyzing
actual examples of adjusting pallets we proved their effectiveness to their applications. The combination of adjusting
pallet function, 1Xnm resolution column and character projection technologies will enable the next generation EB writer
“F7000” to fit from Fab to Lab applications.